GL150 CLIV & GL300 CLIV are the GermanLitho latest fully-automatic full-field, high resolution UV nanoimprint equipment. The GermanLitho proprietary CLIV (Contact Litho into Vacuum) technology ensures the accuracy of imprinted structures and replication fidelity.
GL150 CLIV & GL300 CLIV enable fully-automatic mass production of high resolution (better than 10nm*) and high aspect ratio (better than 10 : 1*) nanostructures on up to 150mm/300mm wafers. This equipment supports cassette to cassette automatic wafer loading and unloading, automatic flexible composite working stamp replication and exchange. All process steps are carried out in a closed and clean environment to ensure the imprinting quality. GL150 CLIV & GL300 CLIV are suitable for mass production of DOE, AR/VR waveguide ( including slanted gratings), WGP, metalens, biochip, LED PSS, MLA and other applications.
Fully-automatic nanoimprint lithography equipment for mass production of high resolution, high aspect ratio structures on up to 150mm/300mm wafers.
CLIV technology ensures the accuracy of imprinted structures and replication fidelity.
Cassette to cassette automatic wafer loading/unloading, optical pre-alignment.
Automatic flexible composite working stamp replication, automatic working stamp exchange. Suitable for mass production.
Fully-automatic nanoimprinting processes including working stamp replication, alignment, imprinting, curing and separation, etc. All process steps are carried out in a closed and clean mini-environment to ensure the imprinting quality.
High power UV LED panel light source (365nm, light intensity >1000mW/cm2) with water cooling, possible customization of power and wavelength of the light source, optional post cure module, perfectly support a variety of commercial nanoimprint materials.
Throughput up to 40 wph possible, suitable for mass production of DOE, AR / VR waveguide ( including slanted gratings), WGP, metalens, biochip, LED PSS, MLA and other applications.
A set of nanoimprint processes and materials starter-kit will be delivered together with the machine, covering processes for DOE, AR slanted grating, high density, high aspect ratio structures and other applications etc., to enable our customers beginning with world leading level of nanoimprint technology based on our experiences.
Substrate size |
GL150 CLIV (open cassette)：2inch, 3inch, 100mm, 150mm GL300 CLIV：200mm (open cassette, SMIF customized) / 300mm (FOUP) (Special sizes can be customized) |
Substrate material |
Silicon, glass, quartz, plastic, metal, etc. |
Wafer loading & unloading |
Cassette to cassette automatic loading/unloading |
Wafer pre-alignment |
Optical pre-alignment |
Supported NIL process |
UV-NIL with GermanLitho proprietary CLIV (Contact Litho into Vacuum) technology guarantees the accuracy of imprinted structures and replication fidelity. |
Resolution |
Better than 10 nm* |
Aspect ratio |
Better than 10:1* |
Residual layer thickness（RLT） |
Less than 10nm* |
UV curing light source |
High power UV LED panel light source (365nm), light intensity >1000mW/ cm2 (2000mw/cm2 optional) |
Mini-environment and climate control |
Standard, external environment class 100, internal environment better than class 10* |
Automatic imprinting |
Supported |
Automatic separation |
Supported |
Automatic working stamp replication |
Supported |
Automatic working stamp loading/unloading |
Supported |
Automatic alignment |
Optional |
Throughput |
Up to 40 wph* possible |